电阻热蒸发与磁控溅射对制备二维银纳米阵列的影响

Effect of resistance thermal evaporation and magnetron sputtering deposition on two-dimensional Ag nanoparticle array structure

利用纳米球刻蚀法制备二维银纳米阵列的过程中,不同的物理气相沉积方法得到的银纳米阵列结构形貌不同。其中电阻热蒸发沉积得到完整三角形状的二维银纳米阵列,而磁控溅射沉积得到蜂窝状银纳米阵列。同时在沉积过程中通过改变金属粒子沉积方向也可获得结构不同的银纳米阵列,其中将基片固定,使蒸发源垂直沉积时制备出的二维银纳米阵列更加致密、完整。最后吸收光谱验证了采用电阻热蒸发垂直沉积时得到结构完整且面积较大的银纳米阵列,以上研究为二维银纳米阵列的应用提供了条件。

Two dimensional Ag nanoparticle arrays with diffrent shapes were fabricated by diffrent deposition ways via nanosphere lithography,Magnetron sputtering deposition formed honeycomb-like nanoparticle array, while thermal evaporation deposition formed perfect triangular shape. Moreover,it was found that different structure of Ag nanoparticle arrays can be obtained by changing the deposition direction, and got a better uniformity and compactness in structure when the deposition direction was perpendicular to the surface of the substrate and the substract was fixed. In the end, the absorption spectrum improved that perfected structure Ag nanoparticle array with bigger area was fabricated by thermal evaporation deposition with perpendicular deposition direction. All these were very crucial for the future fabrication of biochemical sensors with the two-dimensional Ag nanoparticle arrays.