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利用二次阳极氧化方法降低N型碲镉汞材料表面复合速度

Reducing the surface recombination velocity of N-HgCdTe by second anodization
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摘要 利用微波反射光电导衰退法比较了采用一次阳极氧化和二次阳极氧化的N型碲镉汞材料的非平衡载流子寿命及其随温度的变化,通过与理论值进行比较拟合得到了碲镉汞材料表面复合速度随温度的变化曲线.结果发现,二次阳极氧化方法能够更好地降低材料表面悬挂键的密度,同时减少抛光引入的表面缺陷能级的数量,从而降低材料的表面复合速度,改善材料的非平衡载流子寿命,利于制造出高性能的HgCdTe红外探测器. The lifetime of minority carrier as a function of temperature in n-HgCdTe treated by first anodization and second anodization was measured by μ-PCD and compared. The surface recombination velocity as a function of temperature was simulated from the calculated minority carrier lifetime and measured minority cartier lifetime. The results show that second anodization is an effective way to decrease the density of surface dangling bond and surface defect level, thus reduce the surface recombination velocity and increase the minority carrier lifetime which is beneficial to produce HgCdTe detector with high performance.
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2014年第4期391-394,共4页 Journal of Infrared and Millimeter Waves
基金 国家自然科学基金(60907048)~~
关键词 HGCDTE 二次氧化 少子寿命 表面复合速度 HgCdTe, second anodization, minority carder lifetime, surface recombination velocity
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参考文献11

  • 1Lopes V C, Syllaios A J, Chen M C. Minority carrier life- time in mercury cadmium telluride [ J ]. Semiconductor. Sci. Technol. 1993,8: 824-841.
  • 2Nemirovsky Y, Bahir G. Passivation of mercury cadmium telluridc surfaces[J]. J. Vac. Sci. Technol. 1989,7(2): 450 459.
  • 3朱惜辰.碲镉汞探测器的表面钝化[J].红外技术,2001,23(3):9-12. 被引量:4
  • 4Nemirovsky Y, Kidron I. The interface between Hgl-xCdx and its native oxide [ J]. Solid State Electron. 1979, 22: 831.
  • 5Rhiger D R, Kvaas R E. Composition of native oxides etched surface on Hgl-xCdxTe [ J ]. J Vac. Sci. Technol. 1982, 21: 168-171.
  • 6Wager J F, Rhger D R. Surface characterization of Hg0.7 Cd0.3Te native oxides[J]. Vac. Sci. Technol. 1985,A3: 212 -217.
  • 7Lee S H, Shin H C, Lee H C, et al. New surface treatment method for improving the interface characteristics of Cd/ Hgl-xCdxTe heterostructure[J]. Electron. Mater. 1997,26 (6) : 556 - 560.
  • 8汤英文,朱龙源,游达,许金通,刘诗嘉,庄春泉,李向阳,龚海梅.表面二次阳极氧化对HgCdTe光导器件性能的影响[J].半导体光电,2007,28(1):72-75. 被引量:2
  • 9Petersen P E. Auger recombination in Hgl-xCdxTe [ J ]. Appl. Phys. 1970, 41(8) : 3465.
  • 10Reine M B, Maschhoff K R, Tobin S P, et al. The impact of characterization techniques on HgCdTe infrared detector technology [ J ]. Semiconductor. Sci. Technol. 1993, 8 : 788 -804.

二级参考文献12

  • 1储开慧,乔辉,汤英文,陈江峰,胡亚春,贾嘉,李向阳,龚海梅.HgCdTe光伏器件多层钝化膜等离子体处理的研究[J].光学仪器,2006,28(4):56-59. 被引量:1
  • 2Jozwikowska A.Performance of MCT photoconductive detectors[J].Infrared Phys.,1991,31(6):543.
  • 3Ahearn J S,Davis G D,Byer N E.Mechanism of anodic oxidation of Hg0.8 Cd0.2Te[J].J.Vac.Sci.Technol.,1982,20(3):756-759.
  • 4Seelmann-Eggebert M,Carey G,Krishnamurthy V,et al.Effect of cleanings on the composition of HgCdTe surfaces[J].J.Vac.Sci.Technol.B,1992,10(4):1 298-1 311.
  • 5Lee S H,Shin H C,Lee H C,et al.J.Electron.Mater.,1997,26(6):556-560.
  • 6许顺生 徐景阳 谭儒环.用X射线双晶及三晶衍射仪测量晶片的研磨和抛光损伤.半导体学报,1982,3(2):95-101.
  • 7Chang W H, Lee T, Lau W M. An X-ra photoelectron spectroscopic study of chemical etchin and chemo-mechanical polishing of HgCdTe[J]. Jt Appl. Phys. ,1990,68(9) : 4816-4819.
  • 8Zhang Liyao, Qiao Hui, Xu Jintong. Study ofpolishing of HgCdTe wafers[J]. Proc. SPIE, 2011 (8193) : 81933T-81933T-6.
  • 9Mynbaey K D, Ivanov-Omskii V I. Modification of HgCdTe properties by low-energy ions [J]. Semiconductors, 2003,37 (10) :1127-1150.
  • 10桂永胜,褚君浩,郑国珍,郭少令,汤定元,蔡毅.HgCdTe光导探测器的磁阻特性[J].红外与毫米波学报,1997,16(4):256-260. 被引量:2

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