摘要
通过试验重点对粉末冶金法制备高纯溅射铬靶材的传统烧结工艺进行了分析和优化研究。试验结果表明,采用"模压+烧结"或者"冷等静压+烧结"的方式加工靶材,并合理控制烧结温度,能够有效保证靶材的密度。
This paper analyzes and conducts optimation research of traditional preparation of high-purity chromium sputtering target through powder metallurgy. Experimental results show that the ＂molding＋sintering＂ or ＂cold isostatic pressing ＋ sintering＂ processing approach of target can reasonably control the sintering temperature, and the density of the target can be effectively guaranteed.
出处
《山西冶金》
CAS
2014年第4期13-14,17,共3页
Shanxi Metallurgy
关键词
粉末冶金法
高纯溅射铬靶材
方法
powder metallurgy, high-purity chromium sputtering target, method
