飞秒激光在硅表面诱导微结构

Microstrucrures on the Surface of Si Induced by Femtosecond Laser

利用飞秒激光直写加工平台，对飞秒激光脉冲与半导体硅材料相互作用进行了研究。在不同的激光功率和脉冲数作用下，通过定点辐照和扫描方式在硅表面进行微结构诱导。用扫描电子显微镜对表面诱导结构进行表征，实验发现激光功率和脉冲数影响诱导微结构的形貌和周期，并发现诱导得到的周期性条纹结构的取向与诱导激光的偏振方向有关，通过调整激光的偏振方向可以有效地控制结构的取向。通过扫描的方式，可以在硅材料表面制备排列规则的周期结构。依据实验结果，分析了脉冲数对周期性条纹结构周期变化的影响。研究结果为硅材料表面微结构加工提供了参考。

By using femtosecond laser direct writing platform, the interaction between femtosecond and semiconductor silicon material are studied. The formation of microstructure on silicon under fixed dot irradiation and scan with femtosecond laser pulse at different laser power and pulses is described. Scanning electron microscopy is used for observing the morphologies of the surface microstructure. It is experimentally demonstrated that the period and morphology of fabricated microstructures is effected by the laser power and pulse number. The orientation of the period stripe is effected by the polarization direction of the incident femtosecond laser. We can control the period stripe orientation by adjusting the polarization direction of the incident laser. Large area of microstructures can be induced on the surface of material by scanning. According to the experimental results, the effect of pulse number on period is analysed . The results provide a reference to the silicon surface microstructures processing.