低真空脉冲离子氮化工艺试验

Pulsed ion nitriding process test in low vacuum

本文就低真空脉冲离子氮化这种新设备、新技术进行了工艺试验。应用金相检验、扫描电子显微镜分析、X射线能谱分析等进行了检测分析。确定了低真空脉冲离子氮化的最佳工艺参数,制定出脉冲离子氮化的热处理工艺方案。

A process test was conducted for tile new equipment and teehnology of low vacuum pulsed ion nitriding. The metallographic examination, scanning electron mieroscopy and X-ray energy spectrum were used for analysis. The optimum prot＇ess parameters and the heat treatment processes had been determined.