碳化硅反射镜表面粗糙度的优化

Optimization of SiC Mirror Surface Roughness

空间光学技术的迅猛发展对空间光学系统提出了更高的要求;碳化硅材料以其优秀的物理性质,成为广泛应用的反射镜材料;碳化硅反射镜的光学加工研究也在国内外广泛开展。简要讨论了碳化硅反射镜的抛光机理;介绍了碳化硅材料抛光的实验方法;定性分析了碳化硅材料的抛光过程;通过大量的工艺实验和理论分析,讨论磨料粒度、抛光盘材料、抛光盘压力、抛光盘转速、抛光液酸碱度等工艺参数对碳化硅反射镜表面粗糙度的影响,并对各个参数加以优化,得到了优良的实验结果。

As the aerospace technology develops rapidly, more requirements on the aerospace optic system are needed. With excellent physical properties, SiC becomes a very promising material for speculums. The mechanism of polishing on SiC mirror surface is studied, the experimental method of SiC polishing is introduced, and the polishing process is analyzed quantatively. The key factors affecting the surface quality of SiC mirror, such as tools, abrasives, load, rotational speed and slurry pH are studied, chosen and optimized by plenty of experiments and theoretical analysis, and better results are obtained.