电感耦合等离子体发射光谱法测定铜及铜合金中痕量磷

Determination of Trace Phosphorus in Copper and Copper Alloy by ICP-AES

采用电感耦合等离子体原子发射光谱法（ICP-AES）测定铜及铜合金中痕量磷的含量。样品采用盐硝混酸（3＋1）溶解样品,完后加入钼酸铵溶液,用乙酸乙酯做萃取剂,优化分析条件选择出合适的分析谱线P（213.618 nm）。本实验可测定铜及铜合金中0.00005%~0.025%之间的磷含量,在磷的质量浓度在3.00 mg/L以内,其线性回归方程为I=22.73ρ＋0.0022。相关系数为0.999 3,检出限为0.003 mg/L。

Using inductively coupled plasma atomic emission spectrometry （ ICP -AES ） determination of trace phosphorus in copper and copper alloys was carried out.Sampleswith salt mixed with acid （3＋1） to dissolve the sample , after adding ammonium molybdate solution , using ethyl acetate as extracting agent , optimization of select suitable analytical spectral line P （ 213.618 nm ）.This experiment can determine the phosphorus content of copper and copper alloy in 0.00005%~0.025%.The concentration of phosphorus within 3 mg/L, the linear regression equation was I =22.73ρ＋0.0022, he correlation coefficient was 0.999 3, and the detection limit was 0.003 mg/L.