化学气相沉积TiN—沉积温度及基体中碳的影响

Chemical Vapour Deposition of TiN-the Effects of Deposition Temperature and Carbon in the Substrates on CVD TiN

本文研究了沉积温度对Cr12MoV钢基体TiN沉积速率的影响。TiN沉积速率高于低碳钢基体TiN沉积速率,并且随沉积温度升高而增加。研究了不同碳含量铁基体中碳扩散对TiN沉积的影响。TiN沉积速率随碳含量增加线性增加;涂层硬度亦随碳含量增加而增加。基于铁的催化作用,推导出TiN沉积速率方程式:

The effect of deposition temperature on the deposition rate of TiN formed on tile Cr12MoV steel substrates was investigated. Its deposition rate is higher than the value of TiN formed on the low carbon steel substrate as well as nicreased with the increase in deposition temperature. The effect of the carbon diffusion in TiN deposit layer on the deposition of TiN coating coated on the irol—base substrates with different carbon contents was also studied. The deposition rate of TiN is increased linearly with the increase of carbon contents in the substrates. Tte vickers hardness of coatings is also increased with the increase of carbon contents in the substrates. The equation derived for the TiN deposition rate, R=h_1+k_1·c, was based on the catalytic action of iron in the substrates.