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脉冲电镀电源控制系统开发 被引量:2

Development of Control System for Pulse Electroplating Power Supply
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摘要 结合工艺实际,为实现参数宽幅调节及组合调节,设计出一款以单片机为控制核心的脉冲电镀电源。从硬件和软件两方面详细阐述了设计流程及系统构成,并对电源性能进行了测试。结果表明:电源输出较精确且无明显压降,输出波形规整,反映出运行状况稳定。 Combined with actual process and in order to realize parameter wide range regulation and combined adjustment,a pulse electroplating power supply with single-chip microcomputer as control core was designed.The design process and structural composition were elaborated in detail from two aspects of hardware and software,and the properties of the power supply were tested.The results show that the power output is more accurate,has no obvious voltage drop,and the output waveform is regular,which reflects that the operation state is stable.
作者 张怀宇
出处 《电镀与环保》 CAS CSCD 北大核心 2014年第5期44-45,共2页 Electroplating & Pollution Control
关键词 脉冲电镀电源 控制系统 硬件 软件 单片机 pulse electroplating power supply control system hardware software single-chip microcomputer
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