期刊文献+

MPCVD金刚石膜沉积技术及金刚石膜材料在微波电真空器件中的应用

High Quality Diamond Films Material and its Application in Microwave Vacuum Electronic Devices
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摘要 金刚石膜是一种集众多优异性能于一身的新材料,尤其是其热导率高、绝缘性能好以及微波介电损耗低等特点,使金刚石膜在微波电真空器件领域有着重要的应用前景。目前,以微波等离子体化学气相沉积(MPCVD)方法制备高品质金刚石膜的技术已趋向成熟。本文将针对微波电真空器件这一应用背景,简要介绍国内外高品质金刚石膜MPCVD沉积技术的发展现状,进而对金刚石膜材料应用于微波电真空器件领域的一些典型实例进行简单的介绍。 Diamond films as a new material possess a broad range of novel properties. In particular, ultrahigh thermal conductivity, high breakdown voltage as well as low dielectric loss make the material have good application potentials in the field of microwave vacuum electronic devices. In recent years, microwave plasma chemical vapor deposition (MPCVD) technique to produce diamond films have developed rapidly. The MPCVD technique used to produce high quality diamond films is introduced, and application fields of diamond films as a practical material is reviewed, with a special attention paid to the field of microwave vacuum electronic devices.
出处 《真空电子技术》 2014年第5期12-16,共5页 Vacuum Electronics
关键词 微波等离子体法 金刚石膜 微波电真空器件 MPCVD Diamond films Microwave vacuum electronic devices
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参考文献15

  • 1Calame J P, Abe D K. Applications of Advanced Mate- rials Technologies to Vacuum Electronic Devices [J ]. Proceedings of the IEEE, 1999, 87(5) : 840-864.
  • 2The Fraunhofer Institute IAF. CVD Diamond-General Information. http://www, cvd-diamond, eom/geninfo _ en. htm[A]. 2013-9-23.
  • 3唐伟忠,于盛旺,范朋伟,李义锋,苏静杰,刘艳青.高品质金刚石膜微波等离子体CVD技术的发展现状[J].中国材料进展,2012,31(8):33-39. 被引量:12
  • 4Su J J, I.i Y F,Ding M H, etal. A Dome-Shaped Cavity Type Microwave Plasma Chemical Vapor Deposition Re actor [or Diamond Films Deposition. Vacuum[J], 2014, 107: 51-55.
  • 5Weng J, Xiong L W, Wang J H, et al. Investigation of Depositing Large Area Uniform Diamond Films in Muhi- Mode MPCVD Chamber[J]. Diam Relat Mat, 2012, 30: 15-19.
  • 6李博,韩柏,吕宪义微波PCVD法大尺寸透明自支撑金刚石膜的制备及红外透过率[J].新型碳材料,2008,23(3):245-249.
  • 7吴小国,熊瑛,杨保和,李翠平,孙大智,李晓伟.金刚石/硅复合膜的导热特性研究[J].光电子.激光,2007,18(8):963-965. 被引量:6
  • 8Ding M Q, Li I. I., Bai G D, et al. A Study of free Standing Diamond Films for mm TWTs[C]. IEEE Vac- uum Electronics Conference, 2011 : 387-388.
  • 9May P W. Diamond Thin Films: a 21st-Century Material [J]. Phil Trans R Soc Lond, 2000, A358(1766): 473-495.
  • 10Meng Y F, Yan C S, Krasnicki S, et al. High Optical Quality Multiearat Single Crystal Diamond Produced by Chemical Vapor Deposition[J]. Physica Status Solidi, 2012, A209(1): 101-104.

二级参考文献27

  • 1王芳,杨保和.适用SAW器件的高C轴取向ZnO薄膜制备及性能分析[J].光电子.激光,2005,16(1):28-31. 被引量:8
  • 2王建军,吕反修,邬钦崇,隋毅峰,周永成.用发射天线式微波等离子体CVD装置沉积大面积金刚石薄膜[J].高技术通讯,1994,4(11):14-16. 被引量:2
  • 3熊瑛,杨保和,吴小国,孙大智,李明,洪松.H_2-O_2混合气氛刻蚀制备金刚石纳米晶薄膜[J].光电子.激光,2006,17(7):794-797. 被引量:3
  • 4吴小国,熊瑛,杨保和,李翠平,孙大智,李晓伟.金刚石/硅复合膜的导热特性研究[J].光电子.激光,2007,18(8):963-965. 被引量:6
  • 5Donald T Morelli,Ctriad Uher. Correlating optical absorption and thermal conductivity in diarnond[J]. Appi Phy Lett, 1993,63(21):165- 167.
  • 6J E Graebner,S Jin, G W KanTnlott, et al. Unusually high thermal conductivity in diamond filrns[J]. Appl Phys Lett, 1992,60(13):1576-1578.
  • 7S E CoeU,R S Sussmann. Optical thermal and mechanical properties of CVD diarnond[J]. Diomond end Related Materials, 2000,9:1726-1729.
  • 8M El Hakikia,O Elrnozria;ZnO/AIN/diomond layered structure for SAW devices combining high velocity and high electromechoniocd coupling coefficient [ J ] . Diarnond & Related Materials , 2005, 14: 1175-1178.
  • 9K Jagamadham, Hsin Wang. Thermal resistance of interfaces in AIN- diamond thin film composites[J]. Appl Phys, 2002, 91 (3): 1224- 1235.
  • 10D T Morelli,C Uher,C J Robinson. Trarenission of phonons through grain boundaries in diamond films[J]. Appl Phys Lett,1993,62(10) : 1086-1091.

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