生长条件对TiO_2薄膜结构及光学性能的影响

Influence of Growth Conditions on the Structural and Optical Properties of TiO_2 films

为了研究TiO2薄膜的生长机制及结构对其带隙的影响,采用激光脉冲沉积方法在超高真空下制备了TiO2薄膜.X射线衍射结果显示在不同温度和不同缓冲层上生长的TiO2薄膜以板钛矿结构为主,缓冲层对薄膜结构影响不大,高的生长温度提高了薄膜的结晶度.透射谱的结果表明,随着生长温度和生长气压的升高,TiO2的带隙逐渐增大,在生长ZnO做为缓冲层后,TiO2薄膜的结晶度降低,随ZnO结晶度的提高,TiO2对复合薄膜带隙的影响消失.

To study the influence of growth conditions on the structural and optical properties of TiO2 films,a series of TiO2 films are fabricated by using pulsed laser deposition,and are characterized by using x-ray diffraction and transmittance.The results show that the crystallinity of TiO2 films is improved with increasing substrate temperature and the effect of ZnO buffer layer on the crystallinity is tiny.With increasing substrate temperature and oxygen pressure,the band gap energy increases due to the quantum effect.The transmittance of TiO2 films is enhanced from 70%to 85%after deposited ZnO buffer layer.