摘要
Epitaxial evolution of buried cracks in a strain-controlled AIN/GaN superlattice interlayer (IL) grown on GaN tem- plate, resulting in crack-free AIGaN/GaN multiple quantum wells (MQW), was investigated. The processes of filling the buried cracks include crack formation in the IL, coalescence from both side walls of the crack, build-up of an MQW-layer hump above the cracks, lateral expansion and merging with the surrounding MQW, and two-dimensional step flow growth. It was confirmed that the filling content in the buried cracks is pure GaN, originating from the deposition of the GaN thin layer directly after the IL. Migration of Ga adatoms into the cracks plays a key role in the filling the buried cracks.
Epitaxial evolution of buried cracks in a strain-controlled AIN/GaN superlattice interlayer (IL) grown on GaN tem- plate, resulting in crack-free AIGaN/GaN multiple quantum wells (MQW), was investigated. The processes of filling the buried cracks include crack formation in the IL, coalescence from both side walls of the crack, build-up of an MQW-layer hump above the cracks, lateral expansion and merging with the surrounding MQW, and two-dimensional step flow growth. It was confirmed that the filling content in the buried cracks is pure GaN, originating from the deposition of the GaN thin layer directly after the IL. Migration of Ga adatoms into the cracks plays a key role in the filling the buried cracks.
基金
Project supported by the National Natural Science Foundation of China(Grant Nos.11174008 and 61361166007)
the National Basic Research Program of China(Grant Nos.2012CB619306 and 2012CB619301)
the Research Fund for the Doctoral Program of Higher Education of China(Grant No.20100001120012)