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磁控溅射ZrAlCuN薄膜的微观组织与力学性能

Microstructure and Mechanical Properties of ZrAlCuN Films Prepared by Magnetron Sputtering
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摘要 采用磁控溅射技术制备不同原子比的ZrAlCuN薄膜。采用场发射扫描电镜（FESEM）观察截面形貌,高分辨透射电镜分析微观组织结构,纳米压入法测定薄膜的硬度,压入法（维氏压头）测定薄膜的韧性。结果表明：Zr0.36Al0.15Cu0.01N0.48薄膜截面呈纳米尺度柱状晶,沿沉积方向生长,仅存在[111]、[200]、[220]、[311]取向的5-10nm ZrN晶粒,未发现AlN及Cu独立相,硬度约41.7GPa（载荷10mN）,弹性模量约257.8GPa。Zr0.29Al0.24Cu0.08N0.39薄膜呈纳米尺度柱状晶,存在10-20nm ZrN纳米晶以及Cu[111]纳米晶,硬度约27GPa（载荷10mN）,弹性模量约225.8GPa。由于前者具备较高的硬度/弹性模量比,从而表现出较好的韧性。 ZrAlCuN films with different atom ratios were deposited by magnetron sputtering method.The morphology and microstructure were investigated by field emission scanning electron microscopy（FESEM）and transmission electron microscopy（TEM）.Nanoindentation and Vicker＇s indentation methods were used to measure the hardness and toughness of the films,respectively.Results show that the Zr0.36Al0.15Cu0.01N0.48 film exhibits nano-columnar structure extending along the growth direction.Equiaxed ZrN（5-10nm）nano crystals with[111],[200],[220]and[311]orientations other than AlN and Cu are found in this film.Zr0.29Al0.24Cu0.08N0.39 film shows nanocolumnar structure,and there exist ZrN（10-20nm）nano crystals and Cu[111]crystals.Zr0.36Al0.15Cu0.01N0.48 film possesses high hardness and higher H/E（H=41.7GPa and E=257.8GPa）than the Zr0.29Al0.24Cu0.08N0.39 film,resulting in the former better toughness.
作者 杜军 杨班权 孟凡军
机构地区 装甲兵工程学院再制造技术国家重点实验室 装甲兵工程学院机械工程系
出处 《中国表面工程》 EI CAS CSCD 北大核心 2014年第5期109-114,共6页 China Surface Engineering
基金 国家自然科学基金(51102283)
关键词 磁控溅射 薄膜 硬度 韧性 微观组织 magnetron sputtering film hardness toughness microstructure
分类号 TG174.444 [金属学及工艺—金属表面处理]
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参考文献15

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中国表面工程
2014年 第5期

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