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Low Temperature Nitriding of 304 Austenitic Stainless Steel Using RF-ICP Method: the Role of Ion Beam Flux Density

Low Temperature Nitriding of 304 Austenitic Stainless Steel Using RF-ICP Method: the Role of Ion Beam Flux Density
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摘要 The significant role of ion beam flux during nitriding 304 austenitic stainless steel has been investigated by using a radio frequency inductively-coupled plasma reactor into which a sample with negative bias voltage was inserted. A milliammeter is used to detect tile current of ions which collide with the sample and optical emission spectroscopy is used to discern the reactive species included in the nitrogen plasma. The nitriding efficiency is indicated by X-ray diffraction and the microhardness test. The reported data reveal that the ion beam flux density as well as the deposition pressure, bias voltage and time can strongly affect the nitriding of stainless steel via tile expanded multiphase microstructure inside the nitrided layer. The increase in the density of ion flux results in an ascent in the intensity of the expanded peak and a simultaneous decline in the intensity of the 3' austenite peak. The evolution trend of ion beam flux density is described as a function of tile operating pressure and the bias voltage. The maxinmm ion flux density has been achieved at 10 Pa pressure and 500 V bias voltage. A reasonable nitriding region has been, consequently, suggested after comparing this work with previously reported results. The significant role of ion beam flux during nitriding 304 austenitic stainless steel has been investigated by using a radio frequency inductively-coupled plasma reactor into which a sample with negative bias voltage was inserted. A milliammeter is used to detect tile current of ions which collide with the sample and optical emission spectroscopy is used to discern the reactive species included in the nitrogen plasma. The nitriding efficiency is indicated by X-ray diffraction and the microhardness test. The reported data reveal that the ion beam flux density as well as the deposition pressure, bias voltage and time can strongly affect the nitriding of stainless steel via tile expanded multiphase microstructure inside the nitrided layer. The increase in the density of ion flux results in an ascent in the intensity of the expanded peak and a simultaneous decline in the intensity of the 3' austenite peak. The evolution trend of ion beam flux density is described as a function of tile operating pressure and the bias voltage. The maxinmm ion flux density has been achieved at 10 Pa pressure and 500 V bias voltage. A reasonable nitriding region has been, consequently, suggested after comparing this work with previously reported results.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第10期960-963,共4页 等离子体科学和技术(英文版)
基金 supported by Shenyang Science and Technology Plan of China(No.F12028200)
关键词 plasma nitriding inicrostructure stainless steel SURFACES ions beam flux plasma nitriding, inicrostructure, stainless steel, surfaces, ions beam flux
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参考文献9

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