热处理对离子束溅射Ta_2O_5薄膜特性的影响

Effects of annealing on properties of Ta_2O_5 thin films deposited by ion beam sputtering

利用离子束溅射沉积技术制备了Ta2O5薄膜,在100～600℃的大气氛围中对其进行热处理（步进温度为100℃）,并对热处理后样品的光学常数（折射率、折射率非均匀性、消光系数和物理厚度）、应力、晶向和表面形貌进行了研究.研究显示,随着热处理温度增加,薄膜折射率整体呈下降趋势,折射率非均匀性和物理厚度呈增加趋势,结果有效地改善了薄膜的消光系数和应力,但薄膜的晶向和表面形貌均未出现明显的变化.结果表明：热处理可以有效改变薄膜特性,但需要根据Ta2O5薄膜具体应用综合选择最优的热处理温度.本文对离子束溅射Ta2O5薄膜的热处理参数选择具有指导意义.

Ta2O5 films were deposited by Ion Beam Sputtering （IBS） technique and they were annealed in air at the temperatures from 100 ℃ to 600℃ with a step of 100℃. Then the optical constants after annealing （refractive index, the inhomogeneity of refractive index, extinction coefficient and physical thickness）, stress, crystalline and surface morphology were systematically studied. The experimental results indicate that with the annealing temperature increasing, the refractive indexes of the films de- crease in the mass and the inhomogeneity of refractive index and the film thickness increase, by which the extinction coefficient and stress are improved. However, the crystal orientation and surface mor- phology of the films are no significant change. These results demonstrate that the thermal processing changes the characteristics of films but the thermal processing temperature for Ta2O5 films should beselected based on the application demands. These results will be a reference for parameter selection in Ta2O5 film deposition by the IBS.