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InGaAs/GaAs应变量子阱的发光特性研究 被引量:2

Research on Photoluminescence Properties of InGaAs/GaAs Strained Quantum Well
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摘要 利用低压金属有机化学气相沉积技术(LP-MOCVD)生长InGaAs/GaAs单量子阱(SQW),通过改变生长速率、优化生长温度和V/III比改善了量子阱样品的室温光致发光(PL)特性。测试结果表明,当生长温度为600℃、生长速率为1.15μm/h时,生长的量子阱PL谱较好,增加V/III比能够提高量子阱的发光强度。实验分析了在不同的In气相比条件下,生长速率对量子阱质量的影响,利用模型解释了高In气相比时,随着生长速率增加PL谱蓝移现象消失的原因。 Strained InGaAs/GaAs single quantum wells (SQWs) are grown by the low pressure metal-organic chemical vapor deposition (LP-MOCVD). The experimental results show that the photoluminescence (PL) emission of InGaAs/GaAs SQW can be greatly improved by optimizing the growth rate, V/Ⅲ ratio and temperature. It is found that the QW structures grown at the growth temperature of 600 -C and the growth rate of 1.15 μm/h exhibit better PL emission, stronger PL intensity with higher V/Ⅲ ratio. The reason why the blue shift phenomenon of PL spectrum disappear when the InGas ratio is higher is explained by a model.
出处 《光学学报》 EI CAS CSCD 北大核心 2014年第11期342-347,共6页 Acta Optica Sinica
基金 国家自然科学基金(60976038 61107054 61308051 61370043) 国家自然科学基金委员会和中国工程物理研究院联合基金(U1330136) 吉林省科技发展计划(20100419) 高功率半导体激光国家重点实验室基金(C1301)
关键词 薄膜 金属有机化学气相沉积 InGaAs/GaAs单量子阱 生长速率 生长温度 光致发光 thin films metal-organic chemical vapor deposition InGaAs/GaAs single quantum well growth rate^growth temperature photoluminescence
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