摘要
Patterning SiC substrates with focused ion beam for growth of confined graphene nanostructures is interesting for fabrication of graphene devices. However, by imposing an ion beam, the morphology of illuminated SiC substrate surface is inevitably damaged, which imposes significant effects on the subsequent growth of graphene. By using confocal Raman spectroscopy, we investigate the effects of ion beam illumination on the quality of graphene layers that are grown on 6H-SiC （0001） substrates with two different growth methods. With the first method, the 6H-SiC （0001） substrate is flash annealed in ultra-high vacuum. Prominent defects in graphene grown on illuminated areas are revealed by the emergence of Raman D peak. Significant changes in D peak intensity are observed with Ga＋ ion fluence as low as 10^5 μm^-2. To eliminate the damage from the ion beam illumination, hydrogen etching is employed in the second growth method, with which prominent improvement in the quality of crystalline graphene is revealed by its Raman features. The defect density is significantly reduced as inferred from the disappearance of D peak. The Raman shift of G peak and 2D peak indicates strain-released graphene layers as grown in such a method. Such results provide essential information for patterning graphene nano-devices.
Patterning SiC substrates with focused ion beam for growth of confined graphene nanostructures is interesting for fabrication of graphene devices. However, by imposing an ion beam, the morphology of illuminated SiC substrate surface is inevitably damaged, which imposes significant effects on the subsequent growth of graphene. By using confocal Raman spectroscopy, we investigate the effects of ion beam illumination on the quality of graphene layers that are grown on 6H-SiC （0001） substrates with two different growth methods. With the first method, the 6H-SiC （0001） substrate is flash annealed in ultra-high vacuum. Prominent defects in graphene grown on illuminated areas are revealed by the emergence of Raman D peak. Significant changes in D peak intensity are observed with Ga＋ ion fluence as low as 10^5 μm^-2. To eliminate the damage from the ion beam illumination, hydrogen etching is employed in the second growth method, with which prominent improvement in the quality of crystalline graphene is revealed by its Raman features. The defect density is significantly reduced as inferred from the disappearance of D peak. The Raman shift of G peak and 2D peak indicates strain-released graphene layers as grown in such a method. Such results provide essential information for patterning graphene nano-devices.
基金
Supported by the Open Research Fund Program of the State Key Laboratory of Low-Dimensional Quantum Physics under Grant No KF201201, the National Natural Science Foundation of China under Grant Nos 61027011 and 10974245, the National Basic Research Program of China under Grant No 2012CB933002, and the Strategic Priority Research Program （B） of the Chinese Academy of Sciences under Grant No XDB07030100.
