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Fabrication of low threshold current monolithic DFB laser with an MMI combiner

Fabrication of low threshold current monolithic DFB laser with an MMI combiner
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摘要 We fabricate low threshold current monolithic distributed feedback（DFB） laser with a multi-mode interface（MMI） combiner using butt-joint metal-organic chemical vapor deposition technology with different waveguide structures. Multi-layer mask self-aligned photolithography technology is used to form different waveguides in active and passive regions, respectively. The result shows that the laser threshold current is lower than 10 m A, with 50 d B side-mode suppression ratio. We fabricate low threshold current monolithic distributed feedback（DFB） laser with a multi-mode interface（MMI） combiner using butt-joint metal-organic chemical vapor deposition technology with different waveguide structures. Multi-layer mask self-aligned photolithography technology is used to form different waveguides in active and passive regions, respectively. The result shows that the laser threshold current is lower than 10 m A, with 50 d B side-mode suppression ratio.
作者 赵建宜 陈鑫 周宁 黄晓东 刘文
机构地区 Wuhan National Laboratory for Optoelectronics Accelink Technologies Company Institute of Advanced Technology
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2014年第11期99-102,共4页 中国光学快报（英文版）
基金 supported by the National 863 Program of China(Nos.2011AA010304 and 2011AA010306) the National 973 Program of China(No.2010CB327603)
关键词 Distributed feedback lasers Metallorganic chemical vapor deposition Organic chemicals ORGANOMETALLICS PHOTOLITHOGRAPHY Waveguides Distributed feedback lasers Metallorganic chemical vapor deposition Organic chemicals Organometallics Photolithography Waveguides
分类号 TN248 [电子电信—物理电子学] TN248.4 [电子电信—物理电子学]
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Chinese Optics Letters
2014年 第11期

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