摘要
介绍了常用的光刻版清洗工艺,并详细讲解了全自动光刻版清洗机的工作过程。同时,简单介绍了为提高光刻版清洗效果而设计的浸泡系统、药液供给与循环系统和温控系统。
Photomask cleaning processes are introduced. With one of the processes,the operating of the automatic photomask cleaning equipment is present. The principle of the photomask immersion tank,chemical supply and recycle system,and temperature control system are also introduced.
出处
《电子工业专用设备》
2014年第2期23-27,37,共6页
Equipment for Electronic Products Manufacturing
关键词
半导体
光刻版清洗
单晶圆清洗
自动设备
Semiconductor
Photomask cleaning
Single wafer clean
Automatic equipment
