4[2]Reichmanis E. , Smolinski G. , Wilkins C. W.. Approaches to resists for fwo-Leved RIE pattern transfer spplication. Solid State Technology, 1985,28 (8): 130 ～135.
6Lee K Y, Bianca N La, Rishten S A. Micromaching application of a high resolution with thick photoresist[J]. J Vac Sci Technol, 1995,B13 (6): 3012- 3016.
7Lorenze H. Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist [ J ] . Mierosystem Technologies,1998, 4: 143- 146.
8Elgard K, McCloy D A, Thayne I G. Micromachined SU-8 negative resist for MMIC applications on low resistibity COMOS substrates[J] .Microelectronic Engineering, 2003,67-68:417-421.
9Chung C K, Lin C J, Chen C C. Combination of thick resist and electroforming technologies for monolithic inkjet application [ J ] . Microsystem Technologies, 2004, 10: 462-466.
10Butefisch S, Seidemann V, Buttgenbach S.Novel micro-pneumatic actuator for MEMS [J]. Sensors and Actuators, 2002, A97- 98: 638-645.
