摘要
激光图形发生器是一种用于图形转化的硬件接口设备,直接影响着掩膜版的加工质量。激光图形发生器曝光过程中出现的曝光偏移、曝光遗漏问题,严重影响了掩膜版加工的质量和成品率。通过实验和分析,总结了产生曝光偏移、曝光遗漏的一些原因。
The laser pattern generator, a kind of graph transformation hardware interface devices, directly impacts on the quality of mask processing. Because of such problems as exposure offset and exposure omission, the mask processing rate of the finished products is seriously reduced. The experiment and the analysis for the reasons of exposure offset and exposure omissions are concluded.
出处
《微处理机》
2014年第6期12-13,共2页
Microprocessors
关键词
激光图形发生器
掩膜版
曝光
Laser Pattern Generator
Photomask
Exposure