六氟化钨净化工艺研究

Purification Process of Tungsten Hexafluoride

工业制备的初级六氟化钨含有大量杂质气体和金属杂质,必须进行净化,其过程首先采用化学试剂置换去除杂质气体中沸点与六氟化钨接近的氟化氢,然后将反应后的六氟化钨蒸馏至精馏釜中进行低温固化,再利用真空系统抽真空排出其他杂质气体,初步净化后的六氟化钨检测合格,可直接进行精馏去除金属杂质。经过多步净化后,成品六氟化钨的纯度可达99.999%以上。

This paper introduces the purification system and experiment process for hexafluoride tungsten. The prepared primary tungsten hexafluoride contain a large amount of impurity gases and metal impurities. Chemical agents are adopted to react with the hydrogen fluoride whose boiling point is correspondent with tungsten hexafluoride. The reacted tungsten hexafluoride is then distilled to freeze in distillation kettle by low temperature. Vacuum pump is used to exhaust the volatile impurity gases. The qualified tungsten hexafluoride upon initial purificaiton can be distilled directly to remove metal impurities. The results show that the purity of tungsten hexafluoride reaches 99.999%upon multi purification processes.