阳极氧化/GCD新工艺法制备镍基超级电容器薄膜电极

Fabrication of Nickel-Based Composite Film Electrode for Supercapacitors by a New Method of Anodization/GCD

采用磷酸阳极氧化法在金属镍表面形成阳极氧化复合膜,在1 mol·L-1氢氧化钾溶液中进行大电流密度恒流充放电(GCD)处理,使基体表面形成一层多孔纳米花瓣状膜.采用扫描电镜(SEM),X射线光电子能谱(XPS),X射线衍射(XRD)仪,对膜的形貌、组成和结构进行了表征,使用电化学工作站、电池寿命测试仪对该膜的电容特性进行了测试.结果表明,所制氧化膜由三维多孔纳米花瓣状的Ni O、α-Ni(OH)2和β-Ni(OH)2构成,该膜具有优异的电容特性,其在电流密度为6.7 A·g-1时,比电容量达1509 F·g-1,而当电流密度为66.7 A·g-1时,比电容量为1120 F·g-1(为6.7 A·g-1时的74%).在电流密度为66.7 A·g-1时,经过2000次循环测试后比电容量基本保持不变.

A nickel-based composite film was fabricated on Ni foil, by two-electrode anodization and galvanostatic charge-discharge （GCD） treatment. The surface morphology, states of chemical species, and crystal structure of the film were characterized by scanning electron microscopy （SEM）, X-ray photoelectron spectroscopy （XPS）, and X-ray diffraction （XRD）. The electrochemical performance was tested using an electrochemical workstation and battery program-control test system. The test results indicated that the film possessed a nanoflower-like morphology, and consisted of NiO, α-Ni（OH）2 and β-Ni（OH）2. The NiO-α-Ni（OH）2-β-Ni（OH）2 compounds exhibiting a high specific capacitance, superior rate capability, and good cyclability （1509 F·g^-1 at 6.7 A·g^-1, 1120 F·g^-1 at 66.7 A·g^-1, after 2000 cycles, the capacitance of the film remained unchanged）.