摘要
在Na Cl-KCl-Na F-WO3的熔盐体系中在Cu电极上制备了致密的钨沉积层;采用扫描电镜和辉光放电等方法,分析了熔盐组分对钨沉积层的影响。结果表明,当c(Na F)=0.1时,基板表面W含量约为75%;当c(Na F)=0.25和0.4时,基板表面钨含量达到近95%。当熔盐组分摩尔比为c(Na Cl)∶c(KCl)∶c(Na F)∶c(WO3)=0.3385∶0.3385∶0.25∶0.073时,可获得致密而且表面质量较好的钨沉积层。
The deposition of tungsten was obtained in the NaCl-KCl-NaF-WO3 molten salt by electrochemical reduction. The effects of composition of the molten salt on the deposition of tungsten were investigated by means of scanning electron microscopy and glow discharge spectrometer. The results showed that the dense tungsten layer with good surface quality was obtained when the mole fraction of molten salt is c （NaCl）∶c （KCl）∶c （NaF）∶c （WO3）=0.338 5∶0.3385∶0.25∶0.073; the surface content of tungsten is 75% when c（NaF） is 0.1; the surface content of tungsten is 95%when c（NaF） is 0.25 or 0.4.
出处
《工业加热》
CAS
2014年第6期39-41,共3页
Industrial Heating
基金
国家自然科学基金资助项目(51274082)
