摘要
由于三元复合驱中碱的引入,导致采出液在采出系统中形成大量硅垢,而硅垢一旦形成便难以去除。自共聚物防垢剂开发以来,针对硅垢的防垢剂研究报道较少,因此硅垢共聚物防垢剂一直是油田处理药剂研究的热点。作者以衣康酸(IA)、三乙醇胺(TEA)、烯丙基磺酸钠(SAS)、丙烯酰胺(AM)为单体,过硫酸铵为引发剂,合成了一种新型四元共聚物硅垢防垢剂,简称ITSA。通过实验确定合成共聚物防垢剂的最佳工艺条件为:聚合温度65℃,聚合时间3h,m(引发剂)∶m(单体)=8%,单体配比n(IA)∶n(TEA)∶n(SAS)∶n(AM)=1.0∶1.8∶0.2∶1.5。在此合成条件下对硅垢的防垢率达到72.11%。说明该四元共聚物防垢剂对硅垢有较好的防垢效果。防垢剂的作用机理主要是晶格畸变和分散作用。
Due to the introduction of the alkali in ASP flooding, leading to the formation of a large number of produced liquid silicon scale in production system, and silicon scale is difficult to remove when it is once formed. Since the copolymer scale inhibitor is developed,because of a small amount of specialized study of silicon scale inhibitor, therefore the silicon scale copolymer scale inhibitor has been the hot topics in the study of oilfield treatment agent. In this paper, the quadripolymer ITSA silica scale inhibitor was synthesized using itaconic acid(IA),triethanolamine (TEA),sodium allyl sulfonate (SAS), acrylamide(AM) as monomers, ammonium persulfate as initiator, referred to as the ITSA. The best process conditions that determined by the experiment for synthesis of copolymer scale inhibitor were as follow: the polymerization temperature of the quadripolymer ITSA is 65℃, reaction time is 3h,the dosage of initiator is 8%,ratio of n(IA) : n(TEA) : n(SAS) : n(AM) is 1.0 : 1.8 : 0. 2 : 1.5. Inhibition rate is 72.11% ,the quadripolymer inhibitor for silica scale has better inhibitive effect. The mechanism of scale inhibitor is mainly the lattice distortion and dispersion.
出处
《化工科技》
CAS
2014年第6期35-40,共6页
Science & Technology in Chemical Industry
关键词
四元共聚物
硅垢
防垢剂
Quadripolymer
Silica scale
Scale inhibitor