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Structural, optical and electrical properties of zinc oxide thin films deposited by a spray pyrolysis technique 被引量:2

Structural, optical and electrical properties of zinc oxide thin films deposited by a spray pyrolysis technique
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摘要 Zinc oxide(ZnO) thin films were deposited on glass substrates by spray pyrolysis technique decomposition of zinc acetate dihydrate in an ethanol solution with 30 m L of deposition rate, the ZnO thin films were deposited at two different temperatures: 300 and 350℃. The substrates were heated using the solar cells method.The substrate was R217102 glass, whose size was 30×17.5×1 mm^3. The films exhibit a hexagonal wurtzite structure with a strong(002) preferred orientation. The higher value of crystallite size is attained for sprayed films at 350℃, which is probably due to an improvement of the crystallinity of the films at this point. The average transmittance of obtain films is about 90%–95%, as measured by a UV–vis analyzer. The band gap energy varies from 3.265 to 3.294 e V for the deposited Zn O thin film at 300 and 350℃, respectively. The electrical resistivity measured of our films are in the order 0.36 Ω·cm. Zinc oxide(ZnO) thin films were deposited on glass substrates by spray pyrolysis technique decomposition of zinc acetate dihydrate in an ethanol solution with 30 m L of deposition rate, the ZnO thin films were deposited at two different temperatures: 300 and 350℃. The substrates were heated using the solar cells method.The substrate was R217102 glass, whose size was 30×17.5×1 mm^3. The films exhibit a hexagonal wurtzite structure with a strong(002) preferred orientation. The higher value of crystallite size is attained for sprayed films at 350℃, which is probably due to an improvement of the crystallinity of the films at this point. The average transmittance of obtain films is about 90%–95%, as measured by a UV–vis analyzer. The band gap energy varies from 3.265 to 3.294 e V for the deposited Zn O thin film at 300 and 350℃, respectively. The electrical resistivity measured of our films are in the order 0.36 Ω·cm.
出处 《Journal of Semiconductors》 EI CAS CSCD 2015年第1期23-27,共5页 半导体学报(英文版)
基金 supported in part by the National Project Research (PNR) VTRS laboratory of El–Oued University, X-ray diffraction data in this work were acquired with an instrument supported by the University of Biskra
关键词 ZnO thin films substrate temperature spray pyrolysis technique ZnO thin films substrate temperature spray pyrolysis technique
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