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Funneling current in Si-doped infrared n type-GaAs heterostructures emitter

Funneling current in Si-doped infrared n type-GaAs heterostructures emitter
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摘要 In the present work, we measured the forward bias current-voltage (I-V) characteristics of Si-doped n type gallium arsenide (GaAs) heterostructures infrared emitter over a wide temperature range from 350 to 77 K. Results showed that the slopes of the exponential curve changed slowly with temperature. The analysis of the various tunneling mechanisms indicated that the tunneling current varied approximately as a function of - exp(- αEg + βeV) where the parameters α and β varied indistinctively with temperature and voltage tunneling current on the The dependence of forward temperature and bias can be explained by thermally induced band gap shrinkage and bias induced route change respectively. These results will be helpful for application of the optoelectronics device in both high and low temperature ambiences. In the present work, we measured the forward bias current-voltage (I-V) characteristics of Si-doped n type gallium arsenide (GaAs) heterostructures infrared emitter over a wide temperature range from 350 to 77 K. Results showed that the slopes of the exponential curve changed slowly with temperature. The analysis of the various tunneling mechanisms indicated that the tunneling current varied approximately as a function of - exp(- αEg + βeV) where the parameters α and β varied indistinctively with temperature and voltage tunneling current on the The dependence of forward temperature and bias can be explained by thermally induced band gap shrinkage and bias induced route change respectively. These results will be helpful for application of the optoelectronics device in both high and low temperature ambiences.
出处 《Frontiers of Optoelectronics》 CSCD 2014年第4期501-508,共8页 光电子前沿(英文版)
关键词 infrared emitter TUNNELING characteristic energy band gap thermal stress infrared emitter, tunneling, characteristic energy, band gap, thermal stress
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