轴向磁场强度对真空电弧离子镀TiN薄膜的影响

Influence of axial magnetic filed intensity on TiN film deposited by vacuum arc ion plating

采用电弧离子镀方法在不锈钢基体上沉积了TiN薄膜,考察了弧靶与基体之间等离子通道上的轴向磁场强度(0-300高斯)对薄膜表面形貌、组织结构、硬度及弹性模量的影响。结果表明,随着轴向磁场的不断增强,等离子体密度及能量密度不断增大,阴极靶斑点处被熔化的靶材区域增大,阴极斑点附近局部蒸气压升高,薄膜表面较大尺寸的大颗粒数、凹坑数量会因此增多,薄膜粗糙度会因此增大;生长取向由(111)面择优转为(220)面择优并最终趋向无择优取向;薄膜表面硬度及弹性模量均呈现先增大后减小的趋势。

TiN film was deposited on stainless steel substrate by arc ion plating method.Influences of the axial magnetic field which was applied along the plasma conductive channel between the target and substrate on the surface morphology,crystal structure,hardness and elastic modulus of the deposited films have been investigated.The results showed that with increasing intensity of the axial magnetic field,the plasma density,the energy density and the melt area of spot for cathode target material increase and the partial vapor pressure elevates,therefore,the number of the larger macro-particles and the surface pit,the roughness of the films will be increased.The growth orientation changes from （111）plane to （220）plane and eventually tends to random orientation when increasing intensity of the axial magnetic field.The film surface hardness and elastic modulus increase firstly and then decrease when increasing intensity of the axial magnetic field.