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BiVO_4晶体的坩埚下降法生长与性能研究

Growth and Properties of BiVO_4 Crystal by Bridgman Method
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摘要 采用坩埚下降法成功生长出厘米尺寸的单斜相BiVO4晶体并利用X射线衍射仪、偏振光显微镜、接触角测量仪和静电计对其结晶形态、表面畴结构、接触角随光照时间的变化以及电阻率随温度的变化行为进行了研究。发现BiVO4晶体接触角随光照时间呈现先减小后增大的变化规律,同时电阻率随温度升高呈现先增大后减小的正温度系数效应。 BiVO4 single crystal was grown by Bridgman method. The crystal phase,domain structure,contact angle and electrical resistivity were characterized by XRD,polarized light microscopy,contact angle measurement and electrical resistivity testing instruments. The results show that light illumination can induce water wettability changes upon the monoclinic phase BiVO4 crystal surface. The BiVO4 crystal presents positive temperature coefficient effect of resitivity.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2014年第12期3104-3107,共4页 Journal of Synthetic Crystals
基金 科技部重大研究计划项目(2013CB933203) 国家自然科学基金(21373224) 福建省自然科学基金(2012J01242) 国家重点实验室开放课题项目(SKL201202SIC) 中国科学院百人计划择优支持项目
关键词 BiVO4晶体 坩埚下降法 畴结构 接触角 电阻率 BiVO4 crystal Bridgman method domain structure contact angle electrical resistivity
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参考文献13

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