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低噪声双波长数字全息及在超精密加工表面检测中的应用 被引量:1

Low Noisy Dual Wavelength Digital Holography and Application in the Ultra-precision Machining Surface Measurement
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摘要 通过两个不同波长的数字全息包裹相位差产生数字拍频,得到一个等效波长相位图以消除相位包裹,然后用该等效波长相位光程与任一记录波长做比较,确定单波长包裹相位中相位跳变的位置和跳变倍率,进而实现了单波长包裹相位展开,使相位噪声不随等效波长相位展开而放大,结果表明该方法可使相位噪声引入的误差减小2?/?m倍。用650 nm和632.8 nm两个波长的激光对用快刀伺服加工的微结构光学元件表面进行了数字全息测量,得到了等效波长为0.024 mm的加工纹理相位展开图,并用频谱滤波得到了元件微观形貌的低频和高频三维数据,各频段表面的粗糙度分别为33.2 nm,19.3 nm,23.4 nm,分析了各种微观结构产生的原因,并对快刀加工的切削参数进行了分析。 Through the subtraction of two digital holographic wrapped phases for different wavelengths, it yields a beat phase image corresponding to an equivalent wavelength to remove the phase wrapping. By comparing the beat phase image with any recoding wavelength, the position and multiple of the single wavelength phase jump are confirmed. Hence, the wrapped phase in single wavelength phase is wrapped and the phase noise is kept fixed. Simulation and experimental results demonstrate the measure error induced by the phase noise can be reduced to 2Λ/λm. An optical microstructure element surface is measured by the proposed digital holography with dual wavelength of 650 nm and 632.8 nm. The measured optical element is produced with Fast Tool Servo (FTS). The unwrapped phase image of machining mark on the surface of microstructure element is acquired clearly. The equivalent wavelength is 0.024 mm. Then, the three dimensional data of the microstructure profile respectively in high frequency and low frequency regions are obtained by frequency filtering. The roughnesses corresponding to different frequency region are 33.2 nm, 19.3 nm and 23.4 nm respectively. The affecting factors for different machining mark are analyzed. The cutting parameters of the FTS are also deduced.
出处 《光电工程》 CAS CSCD 北大核心 2015年第1期25-31,共7页 Opto-Electronic Engineering
基金 国家自然科学基金资助项目(51005212)
关键词 双波长干涉 微结构表面检测 数字相位测量 相位解包裹 dual wavelength interferometry microstructure surface measurement digital phase measurement phase unwrapped
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参考文献16

  • 1Yamaguchi Hitomi, Shinmura Takeo, Takenaga Maki. Development of a new precision internal machining process using an alternating magnetic field [J]. Precision Engineering(S0141-6359), 2003, 27(1): 51-58.
  • 2袁巨龙,王志伟,文东辉,吕冰海,戴勇.超精密加工现状综述[J].机械工程学报,2007,43(1):35-48. 被引量:136
  • 3Lonardo P M, Lucca D A, De Chiffre L. Emerging trends in surface metrology [J]. CIRP Annals-Manufacturing Technology(S0007-8506), 2002, 51(2): 701-723.
  • 4王云庆,李庆祥,周兆英,薛实福.触针式轮廓测量机构的动态分析及非线性误差的消除[J].仪器仪表学报,1996,17(6):606-611. 被引量:1
  • 5http: //www.taylor-hobson.com.
  • 6Binnig G, Rohrer H, Gerber Ch, et al. Surface studies by scanning tunneling microscopy [J]. Phys. Rev. Lett(S0031-9007), 1982, 49(1): 57-60.
  • 7Rabe U, Arnold W. Atomic-force microscopy at MHz frequencies [J]. Annalen der Physik (S1521-3889), 1994, 3(7/8): 589-598.
  • 8Cuche E, Bevilacqua F, Depeursinge C. Digital holography for quantitative phase-contrast imaging [J]. Opt. Lett(S0146-9592), 1999, 24(5): 291-293.
  • 9Marquet P, Rappaz B, Magistretti J, et al. Digital holographicmicroscopy: a noninvasive contrast imaging technique allowing quantitative visualization of living cells with subwavelength axial accuracy [J]. Opt. Lett(S0146-9592), 2005, 30(5): 468-470.
  • 10钟丽云,张以谟,吕晓旭,钱晓凡,熊秉衡.数字全息中的一些基本问题分析[J].光学学报,2004,24(4):465-471. 被引量:58

二级参考文献115

  • 1苏宏华,徐鸿钧,傅玉灿,肖冰.多层烧结超硬磨料工具现状综述与未来发展构想[J].机械工程学报,2005,41(3):12-17. 被引量:20
  • 2孙希威,张飞虎,董申,康桂文.磁流变抛光去除模型及驻留时间算法研究[J].新技术新工艺,2006(2):73-75. 被引量:15
  • 3刘世民,于栋利,田永君,何巨龙,李东春,陈世镇.用SACP技术研究ELID磨削后的单晶硅片表面变质层[J].电子显微学报,1996,15(6):537-537. 被引量:2
  • 4吕且妮,葛宝臻,张以谟.数字显微像面全息技术研究[J].光电子.激光,2006,17(4):475-478. 被引量:17
  • 5J. W. Goodman, R. W. Lawrence. Digital image formation from electronically detected holograms [J]. Appl. Phys. Lett., 1967, 11: 77-79.
  • 6M. A. Kronrod, N. S. Merzlyakov, L. P. Yaroslavskii. Reconstruction of a hologram with a computer[J]. Soy. Phys. Tech. Phys., 1972, 17: 333-334.
  • 7Coppol A G, Iodice M, Finizio A et al.. Digital holography microscope as tool for microelectromechanical systems characterization and design [J]. J. Microlith, Microfab, Microsyst,2005, 4(1): 013012-1.
  • 8Novak E. MEMS metrology techniques [C]. SPIE, 2005, 5716:173-181.
  • 9A, Kim K. Quantitative phase-contrast microscopy by angular spectrum digital holography[C]. SPIE, 2006, 6090:50-57.
  • 10B. Kemper, G. Bally. Digital holographic microscopy for live cell applications and technical inspection [J]. Appl. Opt., 2008, 47(4) : A52-A61.

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