脉冲偏压对多弧离子镀TiAlN薄膜的成分和结构的影响研究

Effects of pulsed bias on composition and structure of TiAlN films by arc ion plating

采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果表明,随着偏压峰值的增大,表面大颗粒逐渐减少,致密性逐渐变好,薄膜硬度也随之增加。沉积参数对薄膜成分有影响,偏压峰值对薄膜中Al含量有较明显的影响,而占空比则主要影响Ti含量。本文对实验结果进行了较详细的讨论和分析。

TiAlN films were fabricated on the high-speed-steel substrate by arc ion plating. The morphology of the films was investigated using scanning electron microscopy; Energy Disperse Spectroscopy was employed to characterize the surface composi- tion of the films; The thickness of the films were measured by the XP-2 profiler and the deposition rate was obtained by calcu- lations with the deposition time; The hardness of the coatings was tested by Vickers tester; X-ray diffraction was employed to characterize the microstructures. The results show that hardness of the TiAlN films increases with increasing pulsed bias, while the quantity of the macroparticles decreases and the films become dense. Deposition parameters have influence on the composition of the films. The pulse bias shows significant impacts on the content of Al, while the duty ratio has main effects on the content of Ti. The experimental results have been discussed in detail in this paper.