多弧离子镀沉积TiAlN/TiN多层膜的结构与性能

Structure and properties of TiAlN/TiN multilayers by arc ion plating

为研究调制周期对薄膜结构和性能的影响,采用多弧离子镀技术在高速钢上制备TiAlN/TiN多层膜,通过改变调制周期制备了不同层数的TiAlN/TiN多层膜,使用扫描电子显微镜(SEM)、XP-2台阶仪、X线衍射仪(XRD)和维氏硬度计对薄膜的表面形貌、厚度、物相结构和硬度进行测量,并对实验结果进行分析和讨论.结果表明:TiAlN/TiN多层薄膜中膜层的择优生长方向主要表现为Ti Al N相的(0010)取向;调制周期的改变对薄膜的沉积速率基本没有影响;随着调制周期的减小,样品的表面质量提高,显微硬度明显变大.

To study the effects of the modulation period on the structure and properties of thin films, TiA1N/TiN muhilayers were deposited by arc ion plating on high-speed steel. The samples with different layer numbers were obtained by changing the modulation periods. Surface morphology, thickness, phase structure and hardness of the samples were measured by SEM, XP- 2, XRD and Vicker＇s tester, respectively. Based on the experimental results, the influence of the modulation period on the structure and mechanical properties of the muhilayers was analyzed and discussed. The results showed that the preferential growth direction of the TiA1N/TiN muhilayers mainly exists in （0010） orientation of the TiAIN layer. As the modulation de- creases, surface quality of the samples is improved and hence the micro-hardness of the films is increased. However, the mod- ulation of the multilayers has little effects on the deposition rate of the films.