一种强流脉冲电子束入射角等效计算方法

An average method for intense pulsed electron beam incident angles

对电子束能量沉积剖面的变化规律进行了解释,给出了由能量损失函数和能量沉积效率函数之积表示的定性的能量沉积函数表达式。在此基础上,给出了一种关于能量沉积剖面的电子束等效入射角计算方法,分析了方法所带来的影响和适用的范围,采用蒙特卡罗方法对等效结果进行了验证。证明该方法优于入射角的算术平均,尤其在靶材浅层与混合束符合较好。

Electron incident angles have a heavy effect on the energy deposition profile（EDP）in material of the intense pulsed electron beam.The average of electron incident angles must be taken into consideration when carrying out the diagnosis technology research and numerical simulation study,while a widely received method to solve the problem has not yet been presented.This article gives a qualitative analysis on the energy deposition function,which is formed by the energy loss function and energy deposition efficiency function.An average method of electron beam incident angles based on EDP,which is named as EDP average method,is developed,and a qualitative explanation of the electron beam EDP curve is given.The error and applicability of this method are analyzed.M-C tests are designed for comparison with theoretical analysis.The EDP average method has a better performance in calculation of the EDP than the method using arithmetic average directly,especially in the shallow of target material.