磁控溅射Pd膜对Zr70Fe5.4V24.6合金吸/放氢性能的影响

Influence of Magnetron Sputtering Pd on Hydrogen Absorption/Desorption Properties of Zr70Fe5.4V24.6 Alloy

采用磁控溅射技术在Zr70Fe5.4V24.6(质量分数,%,下同)合金基体上沉积Pd膜。研究磁控溅射沉积Pd膜的生长特性和显微组织及Pd膜对Zr70Fe5.4V24.6合金吸/放氢性能的影响规律。结果发现,在Zr70Fe5.4V24.6合金基体上磁控溅射沉积的Pd膜具有fcc结构并在(111)晶面有明显的择优取向。对镀膜后合金吸/放氢性能的测试结果表明,磁控溅射沉积Pd膜对Zr70Fe5.4V24.6合金的活化性能及吸氢动力学无显著影响。沉积Pd膜后Zr70Fe5.4V24.6合金可逆吸氢量H/A由0.63增至1.20,吸氢平台增长量约为90%。氢化物形成焓绝对值的平均值增大约77%,生成熵的平均值增大约56%,沉积Pd膜后的合金与氢结合所形成的氢化物更稳定。

Pd thin film was deposited by radio frequency magnetron sputtering on the Zr70Fe5.4V24.6（wt%） alloy substrate. The growth characteristics and microstructure of the Pd membrane were researched. The influence of Pd on the hydrogen absorption/desorption properties of Zr70Fe5.4V24.6 alloy was also investigated. The results indicate that the sputter deposited Pd film of fcc structure grows with the（111） preferred orientation. The results of hydrogen absorption/desorption properties test show that Pd film has no significant effect on activation properties of Zr70Fe5.4V24.6 alloy, as well as hydriding kinetics. The length of plateau area of P-C-T curves increases by about 90% after Pd membrane deposition; meanwhile, the reversible hydrogen storage capacity H/A increases from 0.63 to 1.20. After Pd film deposition, the absolute value of hydride formation enthalpy and the average value of formation entropy increase by 77% and 56%, respectively, indicating the formation of the more stable hydride.