摘要
本文提出了一种新的监控软X光多层膜膜厚的方法——转速控厚法,利用这种方法镀制的设计周期厚度分别为8.4和10nm,周期数达50对和30对的W/C多层膜,经小角X光衍射测试,结果表明周期厚度随机误差在0.1nm左右。
Reported here is a new technique, rotation speed-controlled layer thickness monitoring, which can accurately monitor very thin layers for soft X-ray mirrors. Three W/C multilayer (d=10 nm,30 periods and d=8.4nm, 50 periods)are fabricated and characterized by low -angle X-ray diffraction. The results show that the random error of the periodic thicknessis being about 0.1nm.
出处
《中国激光》
EI
CAS
CSCD
北大核心
1991年第3期171-175,共5页
Chinese Journal of Lasers
关键词
X光膜
工艺
膜厚
控制
转速控厚法
Layer thickness monitor, rotation speed-controlled thickness monitor, soft X-ray multilayer,random errors of periodic thickness
