实用化高压脉冲电源的研制与改进

Research and improvement of practical high voltage pulse power source

提出了一种基于半导体断路开关(SOS)和两级磁脉冲压缩网络的高压脉冲电源,电源在负载为50Ω时脉冲电压峰值和脉冲宽度为51 k V和120 ns,但在负载为反应器时仅为16 k V和12μs。探讨了电源和反应器之间的匹配,以利于提高电源能量利用效率。根据将反应器整体看成是一级电容的匹配思路,设计出了一级磁压缩电源和两级磁压缩电源与反应器进行匹配。从实验结果可以看出,改进后的电源对大型反应器的效果非常好,负载为反应器时,一级磁压缩电源负载脉冲电压峰值和脉冲宽度为23 k V和6μs,两级磁压缩电源负载脉冲电压峰值和脉冲宽度为30 k V和1.2μs。

A high voltage pulse source based on semiconductor opening switch（SOS）and two-stage magnetic pulse compression network was developed. A 51 kV negative pulse was formed with a pulse width of 120 ns at a load of 50Ω, but the peak voltage and pulse width were 16 kV and 12 μs when the load was a reactor. The matching between generator and reactor was studied for optimizing the pulsed plasma discharge. In term of the idea that the reactor was considered as one-stage capacitor, one-stage and two-stage magnetic pulse source was designed to match the large-scale reactor respectively. The results show that the improved source can well match the large-scale reactor. When the load is a reactor, the peak voltage and pulse width of one-stage magnetic pulse source are 23 kV and 6 μs, while the peak voltage and pulse width of two-stage magnetic pulse source are 30 kV and 1.2 μs.