MOPA结构准分子激光系统的同步控制

Synchronous control for MOPA excimer laser systems

为了使主振荡功率放大结构的Ar F准分子激光器实现双腔同步放电,采用同步逻辑快速响应双腔放电时序,根据同步控制逻辑自动对双腔延时进行精密调节,使用四位二进制计数器实现粗调搜索,快速缩小双腔延时差,而使用通用数字可编程延时芯片来实现小精度延时调节。结果表明,双腔放电同步调节之后,放电时差稳定在23ns左右,同步抖动小于±3ns,满足4k Hz高重复频率下主振荡功率放大结构准分子激光器同步控制的要求。

In order to achieve synchronous discharge of dual-chambers of an Ar F excimer laser based on master oscillation power amplifier（MOPA） structure,synchronization logic was used to respond to dual-chamber discharge timing sequence quickly. According to synchronization control logic,an automatic precision adjustment to dual-chamber delay was made. Coarse search was implemented by using a high-speed synchronous modulo-16 binary counter and dual-chamber delay difference was narrowed quickly. Small precision delay adjustment was achieved by using universal digital programmable delay chip. The results show that discharge time differences steadies at about 23 ns less than ± 3ns synchronization jitter after dual-chamber discharge synchronous adjustment. It can meet MOPA structure excimer laser synchronous control requirements under high repetition frequency of 4kHz.