摘要
采用多靶磁控溅射技术,制备一系列不同V含量的TaVCN复合膜。利用X射线衍射仪、纳米压痕仪和高温摩擦磨损仪研究该复合膜的微结构、力学性能和摩擦磨损性能。结果表明,TaVCN复合膜为面心立方和底心斜方的双相结构。随V含量增加,复合膜的硬度先升高后降低,当V原子分数为26.85%时,复合膜的硬度达到最大值,为31.7GPa。室温下随V含量增加,复合膜的摩擦因数和磨损率均先减小后增大,V原子分数为32.60%时,摩擦因数达到最小值,为0.213;V原子分数为26.85%时,磨损率达到最小值,为2.1×10-7mm2/N。随温度升高,复合膜的摩擦因数逐渐减小,磨损率逐渐增大。并对不同温度下TaVCN和TaCN复合膜的摩擦磨损性能进行了讨论。
Ta VCN Nano–composite films with different vanadium contents were synthesized by multi–target magnetron sputtering technique. The microstructure, mechanical and tribological properties of Ta VCN films were investigated by X-ray diffraction, nano-indentation, high-temperature ball-on-disc tribo-meter technology. The results show that Ta VCN films exhibite the fcc crystal structure and base-centered orthor hombic structure. The hardness first increases and then decreases with increasing vanadium content in the films and the highest value is 31.7 GPa, at 26.85%(atomic fraction) V. The friction coefficient and wear rate of Ta VCN films first decrease and then increase with increasing vanadium content and the lowest value of friction coefficient is 0.213 with 32.60% V, wear rate is 2.1×10^-7 mm^2/N with 26.85% V at room temperature. At high temperature, the friction coefficient decreases gradually, while the wear rate increases gradually with increasing temperature. Besides the above, the tribological property of Ta VCN and Ta CN films at different temperature were also discussed in this work.
出处
《粉末冶金材料科学与工程》
EI
北大核心
2015年第1期126-132,共7页
Materials Science and Engineering of Powder Metallurgy
基金
国家自然科学基金资助项目(51074080)
国家自然科学基金资助项目(51374115)