溅射气压对Li-W共掺杂ZnO薄膜性能的影响

Impact of Sputtering Pressure on Li-W Co-Doped ZnO Thin Films

通过RF磁控溅射在不同溅射气压环境中,在石英衬底上制备得到Li-W共掺杂Zn O薄膜(LWZO)。对样品进行X射线衍射(XRD)、扫描电镜(SEM)、透过率以及电阻率的测试。结果表明:适当溅射气压环境下,有助于提高LWZO薄膜的结晶质量;SEM结果显示随着溅射气压增加LWZO薄膜表面晶粒粒径更小,表面更平整;薄膜的透光率保持在85%左右。光致发光光谱表明:LWZO的光致发光由本征发光及缺陷发光组成,结晶度高以及择优取向好,本征发光强度强。同时,薄膜的最低电阻率也达到了6.9×10-3Ωcm。

The Li-W co-doped ZnO thin film （LWZO） was synthesized by RF magnetron sputtering on quartz glass substrate. The effect of the deposition conditions,including but not limited to the pressure,Li-W contents and deposition rate,on its microstructures and properties were investigated. The LWZO coatings were characterized with X-ray diffrac- tion, scanning electron microscope, photoluminescence spectroscopy. The preliminary results show that the pressure has a major impact on the microstructures and properties of the LWZO coatings. For instance, as the pressure increased, the crystallinity of the LWZO coatings changed in an increase-decrease mode, accompanied by a reduced grain size and smoother surfaces. Synthesized at 1.0 Pa, its average transmittance （in 400 ~ 1200 nm range） and its lowest resistivity were found to be about 85% and 6.9 x 10-3 Ωcm,respectively.