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Effect of Argon Addition on Morphology and Structure of Diamond Films(from Microcrystalline to Nanocrystalline)

Effect of Argon Addition on Morphology and Structure of Diamond Films(from Microcrystalline to Nanocrystalline)
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摘要 Micro-/nanocrystalline diamond films deposited in Ar/H2/CH4 microwave plasmas have been studied, with argon flow rates in the range of 70-100 sccm. The effects of argon addition on morphology, surface roughness, quality and structure were investigated by scanning electron microscopy, surface profiler, Raman spectrometer and X-ray diffraction (XRD). It is demonstrated that when the argon flow rate is 70 sccm or 75 sccm, well-faceted polycrystalline diamond films can be grown at a low substrate temperature less than 610 ~C. With the increase in the argon flow rate, the smooth crystallographic planes disappear gradually. Instead, rough crystallographic planes made up of small aggregates begin to take shape, resulting from the increase in the secondary nucleation rate. Nanocrystalline diamond films were obtained at a flow rate of 100 sccm, and all of the prepared diamond films were smooth, with a surface roughness (Ra) less than 20 nm. Raman analyses reveal that the amount of amorphous carbon increases significantly with the increase in argon flow. The results of XRD show that crystalline size and preferential orientation of diamond films depend on the argon content in the plasmas. Micro-/nanocrystalline diamond films deposited in Ar/H2/CH4 microwave plasmas have been studied, with argon flow rates in the range of 70-100 sccm. The effects of argon addition on morphology, surface roughness, quality and structure were investigated by scanning electron microscopy, surface profiler, Raman spectrometer and X-ray diffraction (XRD). It is demonstrated that when the argon flow rate is 70 sccm or 75 sccm, well-faceted polycrystalline diamond films can be grown at a low substrate temperature less than 610 ~C. With the increase in the argon flow rate, the smooth crystallographic planes disappear gradually. Instead, rough crystallographic planes made up of small aggregates begin to take shape, resulting from the increase in the secondary nucleation rate. Nanocrystalline diamond films were obtained at a flow rate of 100 sccm, and all of the prepared diamond films were smooth, with a surface roughness (Ra) less than 20 nm. Raman analyses reveal that the amount of amorphous carbon increases significantly with the increase in argon flow. The results of XRD show that crystalline size and preferential orientation of diamond films depend on the argon content in the plasmas.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2015年第3期216-220,共5页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(No.11175137)
关键词 polycrystalline diamond nanocrystalline diamond argon addition low tern perature microwave plasmas polycrystalline diamond, nanocrystalline diamond, argon addition, low tern perature, microwave plasmas
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  • 1Gruen D M. 1999, Annual Review of Materials Science, 29:211.
  • 2Zou Y S, Li Z X, Wu Y F, et al. 2010, Vacuum, 84: 1347.
  • 3Erdemir A, Bindal C, Fenske G R, et al. 1996, Dia- mond and Related Materials, 5:923.
  • 4Williams O A. 2011, Diamond and Related Materials, 20:621.
  • 5Lisi Nicola, Giorgi Rossella, Dikonimos Theodoros, et al. 2010, Diamond and Related Materials, 19:1382.
  • 6Yuasa Motokazu, Kawarada Hiroshi, Wei Jin, et al. 1991, Surface and Coatings Technology, 49:374.
  • 7Sun Shishuai, Jia Xiaopeng, Yan Bingmin, et al. 2014, Diamond and Related Materials, 42:21.
  • 8Othman M Zamir, May Paul W, Fox Neil A, et al. 2014, Diamond and Related Materials, 44:1.
  • 9Jeedigunta Sathyaharish, Xu Zhenqing, Hirai Makoto, et al. 2008, Diamond and Related Materials, 17:1994.
  • 10Liang Xingbo, Wang Lei, Zhu Hongliang, et al. 2007, Surface and Coatings Technology, 202:261.

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