摘要
光刻机掩模台的宏动台由4个永磁直线电机构成,每侧2个,对称分布在宏动台的两侧。宏动台做大行程、宽范围、高速直线运动。掩模台宏动台共由4个永磁同步电机驱动,两侧电机的同步与否不仅影响到宏动台的定位精度,而且不同步会对宏动台框架产生扭矩致使其产生机械形变,造成机械损伤。本文提出基于补偿原理的同步控制,将台体两侧的位置差作为补偿量,叠加到滞后一侧电机的给定电压信号中,实现两侧电机的同步控制。
The macro stage of Lithography＇s reticle stage is constituted by the four permanent magnet linear motor, two on each side, symmetrically distributed on both sides of the macro stage. Macro stage carries on bigger stroke, wide range, highspeed linear motion. Macro stage comprises four permanent magnet synchronous motor, so synchronous motors are running whether sync or not will not only affect the positioning accuracy of the macro stage, but also produce mechanical torque which generate framework deformation of macro stage, if not sync, resulting in mechanical damage. This paper puts forward that the synchronization control based on the principle of compensation for the difference in position on both sides of the platform body as a compensation amount that is added to the side of the motor for a given hysteresis voltage signal, to reach the synchronization control of four motors..
出处
《自动化技术与应用》
2015年第2期5-8,23,共4页
Techniques of Automation and Applications
关键词
光刻机掩模台
补偿原理
同步控制
PID
lithography reticle stage
compensation principle
synchronization control
PID
