摘要
采用单台阶能量光栅扫描以及R-on-1测试两种不同预处理方式研究了激光预处理技术对532nm HfO2/SiO2高反膜的阈值提升效果。用Nd:YAG二倍频激光对电子束蒸发制备的532nm HfO2/SiO2高反膜进行1-on-1损伤阈值测试,然后分别进行单台阶能量光栅扫描以及R-on-1测试。通过对损伤概率以及损伤形貌的分析,发现激光预处理能够去除薄膜内低阈值缺陷,达到提高损伤阈值的目的,损伤阈值分别提高38%和30%。
Two different laser conditioning methods including n%raster scanning and R-on-1test were conducted to investigate the conditioning effect of 532 nm high reflectors.The Nd：YAG second harmonic laser was employed to do 1-on-1test for532 nm high reflectors prepared by electron beam evaporation.Afterwards,n% raster scanning and R-on-1test were done for comparison.The analysis of damage probability and damage morphologies shows that,laser conditioning could eliminate the defects with low threshold in coatings,thus enhancing the laser damage threshold of 532 nm high reflectors（by 38% and 30%in n% raster scanning and k-on-1test,respectively）.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2015年第3期254-259,共6页
High Power Laser and Particle Beams
基金
国家自然科学基金项目(61308021)
关键词
电子束蒸发
532nm高反膜
激光预处理
损伤阈值
缺陷
E-beam evaporation
532nm high reflective coatings
laser conditioning
laser-induced damage threshold
defects
