不同沉积功率对CVD金刚石涂层性能的影响

Effect of different deposition power on the properties of CVD diamond coating

利用热丝化学气相沉积法(HFCVD),固定其他工艺参数,通过改变沉积功率在YG6硬质合金上制备金刚石涂层,并利用扫描电镜(SEM)、洛氏硬度计和Raman光谱对涂层进行性能测试。结果表明:两步法处理硬质合金基体,可以有效去除表层的Co,同时增大表面粗糙度,提高金刚石形核率,提高涂层附着力;涂层表面形貌观察可知,沉积功率4kW时,晶形完整,晶粒大小非常均匀致密,晶面主要呈现金刚石典型的(111)面生长;压痕测试表明,当功率为4kW时,涂层的结合力最好,表面均匀、平整;结合Raman光谱分析,功率4kW时,涂层质量很好。

Hot filament chemical vapor deposition（HFCVD） method was used to deposit diamond coating on YG6 cemented carbide, by changing the deposition power and fixing the other process parameters. Scanning electron microscopy （SEM）, Rockwell hardness tester and Raman spectroscopy were used to evaluate the properties of the diamond coatings. Results showed that the two-step pretreatment could effectively remove the surface Co of cemented carbide substrates, increase the surface roughness, improve the diamond nucleation rate and coating adhesion. Coating surface morphology observed by SEM showed that the crystal shape was integrated with uniform grain size, mainly a typical （111） surface when deposition power was 4 kW. The indentation tests showed that the adhesion strength was best with smooth surface when deposition power was 4 kW. Combined with the Raman spectroscopy analysis, the coating quality was very well.