摘要
Aluminum-doped zinc oxide/platinum/fluorine-doped tin oxide（AZO/Pt/FTO） trilayer films were prepared by sputtering 5-nm-thick Pt layers and 150-nm-thick AZO layers in sequence on commercial FTO glass.The effects of onestep annealing and layer-by-layer annealing on the morphology,structure and photoelectric properties of the AZO/Pt/FTO trilayer films were comparatively analyzed.It is found that the both annealing approaches increased the grain size and improved the crystallinity of the films,leading to enhancement in transmittance and conductivity.However,layer-by-layer annealing led to the formation of quasi-continuous or continuous AZO layers,different from the sparsely distributed AZO particles brought about by one-step annealing,resulting in excellent optical and electrical properties.Specifically,after layer-by-layer annealing at 400 ℃ for both Pt and AZO layers,the AZO/Pt/FTO trilayer film showed an increase in average transmittance from 71.3% to 85.3% and a decrease in sheet resistance from 7.5 to 5.6 Ω/□,leading to the highest figure of merit of 3.64 × 10^（-2） Ω^（-1）.
Aluminum-doped zinc oxide/platinum/fluorine-doped tin oxide（AZO/Pt/FTO） trilayer films were prepared by sputtering 5-nm-thick Pt layers and 150-nm-thick AZO layers in sequence on commercial FTO glass.The effects of onestep annealing and layer-by-layer annealing on the morphology,structure and photoelectric properties of the AZO/Pt/FTO trilayer films were comparatively analyzed.It is found that the both annealing approaches increased the grain size and improved the crystallinity of the films,leading to enhancement in transmittance and conductivity.However,layer-by-layer annealing led to the formation of quasi-continuous or continuous AZO layers,different from the sparsely distributed AZO particles brought about by one-step annealing,resulting in excellent optical and electrical properties.Specifically,after layer-by-layer annealing at 400 ℃ for both Pt and AZO layers,the AZO/Pt/FTO trilayer film showed an increase in average transmittance from 71.3% to 85.3% and a decrease in sheet resistance from 7.5 to 5.6 Ω/□,leading to the highest figure of merit of 3.64 × 10^（-2） Ω^（-1）.
基金
supported by the National Key Basic Research Development Program of China(No. 2011CB013000)
the Jiangsu Province Research Innovation Program of College Graduate(No.CXZZ13_0663)
the Senior Talent Research Foundation of Jiangsu University(No.13JDG045)
the Open Research Fund Program of Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology(No. GZ201307)
