摘要
A VUV beamline at the Shanghai Synchrotron Radiation Facility （SSRF） for angle-resolved photoelectron spectroscopy （ARPES） measurements is designed. To increase the resolution and bulk sensitivity, a photon energy as low as 7 eV is desired. Because the reflectivity for p-polarized photons strongly decreases when the photon energy is below 30 eV, the design of a high flux beamline for low energy VUV photons is a challenge. This work shows a variable including angle Varied Line-space Plane-Grating Monochromator （VLPGM） with varied grating depth （VGD） which can achieve both high resolution and high flux with broad energy coverage.
A VUV beamline at the Shanghai Synchrotron Radiation Facility （SSRF） for angle-resolved photoelectron spectroscopy （ARPES） measurements is designed. To increase the resolution and bulk sensitivity, a photon energy as low as 7 eV is desired. Because the reflectivity for p-polarized photons strongly decreases when the photon energy is below 30 eV, the design of a high flux beamline for low energy VUV photons is a challenge. This work shows a variable including angle Varied Line-space Plane-Grating Monochromator （VLPGM） with varied grating depth （VGD） which can achieve both high resolution and high flux with broad energy coverage.
基金
Supported by National Natural Science Foundation of China(10979021,11027401,11174054,11304338,11227902)
the Ministry of cience and Technology of China(2011CB921800)
"Strategic Priority Research Program(B)"of Chinese Academy of Sciences(XDB04010100)
