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Mg_xZn_(1-x)O薄膜样品制备及其结构与带隙分析 被引量:1

The Preparation of Mg_xZn_(1-x)O Films and the Analysis of its Structure and Optical Bandgap
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摘要 利用共溅射技术制备了MgxZn1-xO薄膜样品,研究了Mg的掺杂浓度对其晶体结构、光学带隙的影响,退火环境与温度对其晶体结构、表面形貌的影响.通过对XRD图的分析表明,所制MgxZn1-xO薄膜样品为六角纤锌矿结构,且随着x值的增大,样品的晶格常数c逐渐减小;对比真空环境下,氧气中退火温度为500~600℃时更有利于提高样品的结晶质量.对吸收谱的分析表明随着Mg掺杂浓度增大,样品的吸收边向短波方向移动,带隙增大. The MgxZn1-xO film samples were grown by co- sputtering technique. The effect of Mg concentration x on crystalline structure and optical bandgap, the influence of annealing atmosphere and annealing temperature on the crystalline structure and morphology were investigated. The prepared MgxZn1-xO film belong to wurtzite structure and lattice constant c keep decreasing with increasing of x by analysis of X- ray diffraction pattern. The crystalline quality of the MgxZn1 -x O film annealed in O2 atmosphere at 500 -600 ℃ become better, compared with the MgxZn1 -x O film annealed in vacuum. Analysis results of absorption spectrum showed that absorption edge shifted to short wave and optical bandgap enlarged with increasing of x.
出处 《哈尔滨师范大学自然科学学报》 CAS 2015年第2期109-112,共4页 Natural Science Journal of Harbin Normal University
基金 黑龙江省自然基金项目(F201202) 黑龙江省教育厅骨干教师项目(1251G031) 黑龙江省研究生创新科研资金项目(No.YJSCX2011-414HLJ) The Natural Science Foundation of Heilongjiang Province under Grant(A201304)
关键词 共溅射 MgxZn1-xO薄膜 退火 蓝移 带隙 Co - sputtering MgxZn1 -x Ofilm Annealing Blue shift Bandgap /
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