新型直流磁控溅射电源的研究与设计

Research and Design of a Novel DC Magnetron Sputtering Power Supply

研究并设计了一种适用于直流磁控溅射的新型数字化电源。针对直流磁控溅射工艺的要求,从系统控制策略和电弧保护两方面进行研究。设计了带指令电流前馈补偿的双闭环控制策略,并给出详细的设计方法;提出溅射过程出现异常弧光现象时,针对软弧和硬弧采取不同保护方式的两级保护方法,并描述了基于HCPL-316J的驱动电路设计。搭建10 kw实验样机进行验证,结果表明带指令电流前馈补偿的双闭环控制策略具有良好的动态性和稳定性,两级保护方法可有效熄灭电弧,提升溅射的质量。

A novel digital power supply applies to DC magnetron sputtering is developed.For DC magnetron sputtering process requirements, research the system control strategy and arcing protection.A double closed loop with current-ref- erence feed-forward loop compensation control strategy is designed,with the detailed design method.A two-levels of protection method is proposed for extinguish the soft-arc and hard-arc with different ways when abnormal phenomena arcing during sputtering.A driver circuit based on the HCPL-316J is showed.A 10 kW prototype is designed to verify. Experimental results show that the design of the control strategy has good dynamic and stability, the proposed two-levels of protection method can effectively extinguish arcing and enhance the quality of sputtering.