摘要
主要研究了脉冲电场作用下的纯化学处理对Ni Ti形状记忆合金表面涂膜的影响;同时分析了不同作用参数的脉冲电流,对试样表面羟基磷灰石膜层生长的影响规律,得到了合适的脉冲电场参数。结果表明:脉冲电场的加入加速了钙磷层的沉积,提高了羟基磷灰石膜的致密度和纯度。
The effects of calcification treatments under the impulse supply on the properties of apatite layer fabricated on Ni Ti shape memory alloys are investigated.Impulse current is an important parameter for the film forming law of apatite layer.The effects of impulse parameters has been analyzed,after that obtained the applicable impulse parameters.The results indicated that pulse current was beneficial to deposition of apatite layer,and remarkably enhanced the density and purity of hydroxyapatite layer.
出处
《科学技术与工程》
北大核心
2015年第9期50-55,共6页
Science Technology and Engineering
基金
国家自然科学基金项目(51201061)
河南省科技创新杰出人才支持计划项目(144200510001)资助
