摘要
采用工业用直流脉冲等离子体增强化学气相沉积PCVD技术在硅烷、氢气和氮气的混合气氛下成功制备了Ti Si N涂层,重点讨论了混合气体比例对薄膜性能的影响。结果表明:当混合气体中H2∶N2为4∶1、硅烷流量为2sccm时,Ti N/Ti Si N涂层中硅含量为8.01at%,此时,获得此工艺薄膜的最高硬度为28GPa。
The Ti Si N coating was successfully prepared by the use of PCVD technology what the industrial use of pulsed DC plasma enhanced chemical vapor deposition of,in the conditions of mixed atmosphere of silane,hydrogen and nitrogen. This paper main discussed the influence of mixed gas ratio on the properties of the films. The result shows that：when the H2∶ N2 gas mixture is 4∶1,silane flow rate is 2sccm,the silicon content of Ti N / Ti Si N coating is 8. 01at%,at this same time,the highest hardness acquired is 28 GPa.
出处
《工具技术》
北大核心
2015年第4期16-17,共2页
Tool Engineering
基金
国家科技重大专项"复杂数控刀具创新能力平台建设"(2012ZX0412021)
