摘要
为了更好的控制全自动单片清洗设备,通过研究设备的结构和运行流程,提出了一种基于工位自控制的方法实现设备自动运行的软件设计,使各工位并行运行,提高了运行效率。
In order to better control of the automatic single wafer cleaning equipment, offered a software design based on workstation self-control that made equipment auto run through the study of equipment's structure and running flow of automatic. It made each workstation run in paralleled and increased running efficiency.
出处
《电子工业专用设备》
2015年第1期39-42,共4页
Equipment for Electronic Products Manufacturing
关键词
半导体设备
自控制
单片清洗
软件设计
Semiconductor Equipment: Self-control: Single wafer clean: Sottware design