基于工位自控制的全自动单片清洗设备的软件设计

Software Design of Automatic Single Wafer Cleaning Equipment Based On Workstation Self-control

为了更好的控制全自动单片清洗设备,通过研究设备的结构和运行流程,提出了一种基于工位自控制的方法实现设备自动运行的软件设计,使各工位并行运行,提高了运行效率。

In order to better control of the automatic single wafer cleaning equipment, offered a software design based on workstation self-control that made equipment auto run through the study of equipment＇s structure and running flow of automatic. It made each workstation run in paralleled and increased running efficiency.